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Effects of CdCl2 treatment on deep levels in CdTe and their implications on thin film solar cells;\ud A comprehensive photoluminescence study

机译:CdCl2处理对CdTe深层的影响及其对薄膜太阳能电池的影响; \ ud 全面的光致发光研究

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摘要

This work is aimed at studying defect level distributions in the bandgap of CdTe thin films,\udused for solar cell development. In particular, the effects of CdCl2 treatment on the defect\udlevels are the main objectives of this research. Four different CdTe thin films were\udelectroplated using three different Cd-precursors (CdSO4, Cd(NO3)2 and CdCl2), and bulk\udCdTe wafers purchased from industry (Eagle Pitcher and University Wafers in US) were\udstudied using low temperature photoluminescence. The finger prints of defects, 0.55 eV\udbelow the conduction band down to the valence band edge were investigated. In all of the\udCdTe layers, four electron trap levels were observed with varying intensities but at very\udsimilar energy positions, indicating that the origin of these defects are mainly from native\uddefects. CdCl2 treatment and annealing eliminates two defect levels and the mid-gap\udrecombination centres are reduced drastically by this processing step. The optical bandgap of\udall four as-deposited CdTe layers is ~1.50 eV, and reduces to ~1.47 eV after CdCl2 treatment.\udThe material grown using the CdCl2 precursor seems to produce CdTe material with the\udcleanest bandgap, most probably due to the built-in CdCl2 treatment while growing the\udmaterial.
机译:这项工作旨在研究用于太阳能电池开发的CdTe薄膜带隙中的缺陷能级分布。特别是,CdCl2处理对缺陷\ ud水平的影响是本研究的主要目标。使用三种不同的Cd前体(CdSO4,Cd(NO3)2和CdCl2)对四种不同的CdTe薄膜进行了\ ud电镀,并使用了低温光致发光技术对从工业界购买的大块\ udCdTe晶片(美国的Eagle Pitcher和University Wafers)进行了研究。 。研究了在导带以下至价带边缘以下0.55 eV \的缺陷的指纹。在所有的\ udCdTe层中,观察到四个电子陷阱能级,它们的强度不同,但能量位置非常相似,表明这些缺陷的来源主要来自天然缺陷。 CdCl2处理和退火消除了两个缺陷水平​​,并且通过该处理步骤大大降低了中间间隙/复合中心。沉积的四个CdTe层的光学带隙约为1.50 eV,经过CdCl2处理后,其光学带隙约为1.57 eV。使用CdCl2前体生长的材料似乎产生的带隙最干净的CdTe材料,最可能是由于内置CdCl2处理,同时生长材料。

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